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Communication Dans Un Congrès Année : 2023

Plasma etching processes of a sub-10 nm resolution high-x block copolymer self-assembled into spin-on-carbon trenches

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hal-04511496 , version 1 (19-03-2024)

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  • HAL Id : hal-04511496 , version 1

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A. F. Putranto, C. Petit-Etienne, B. Cabannes-Boué, G. Fleury, G. Cunge, et al.. Plasma etching processes of a sub-10 nm resolution high-x block copolymer self-assembled into spin-on-carbon trenches. 13th Plasma Etch and Strip in Microtechnologies workshop (PESM), Jun 2023, Grenoble, France. ⟨hal-04511496⟩
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