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Communication Dans Un Congrès Année : 2023

Carbon resist microlens etching in DF-CCP CF4 plasmas: Comparison between modeling and experiments

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hal-04509406 , version 1 (18-03-2024)

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  • HAL Id : hal-04509406 , version 1

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P Ducluzaux, D Ristoiu, G Cunge, E Despiau-Pujo. Carbon resist microlens etching in DF-CCP CF4 plasmas: Comparison between modeling and experiments. 69th American Vacuum Society (AVS) International Symposium, Oct 2023, PORTLAND, United States. ⟨hal-04509406⟩
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