Optimizing interferences of DUV lithography on SOI substrates for the rapid fabrication of sub-wavelength features - Université Grenoble Alpes Accéder directement au contenu
Article Dans Une Revue Nanotechnology Année : 2021

Optimizing interferences of DUV lithography on SOI substrates for the rapid fabrication of sub-wavelength features

Résumé

Scalable fabrication of Si nanowires with a critical dimension of about 100 nm is essential to a variety of applications. Current techniques used to reach these dimensions often involve e-beam lithography or deep-UV (DUV) lithography combined with resolution enhancement techniques. In this study, we report the fabrication of <150 nm Si nanowires from SOI substrates using DUV lithography (λ=248 nm) by adjusting the exposure dose. Irregular resist profiles generated by in-plane interference under masking patterns of width 800 nm were optimized to split the resulting features into twin Si nanowires. However, masking patterns of micrometre size or more on the same photomask does not generate split features. The resulting resist profiles are verified by optical lithography computer simulation based on Huygens−Fresnel diffraction theory. Photolithography simulation results validate that the key factors in the fabrication of subwavelength nanostructures are the air gap value and the photoresist thickness. This enables the parallel top-down fabrication of Si nanowires and nanoribbons in a single DUV lithography step as a rapid and inexpensive alternative to conventional e-beam techniques.

Domaines

Matériaux
Fichier principal
Vignette du fichier
Article version word sans Nanotechnology-1.pdf (714.38 Ko) Télécharger le fichier
Origine Fichiers produits par l'(les) auteur(s)

Dates et versions

hal-03318890 , version 1 (25-11-2021)

Identifiants

Citer

Olfa Karker, Romain Bange, Edwige Bano, Valerie Stambouli. Optimizing interferences of DUV lithography on SOI substrates for the rapid fabrication of sub-wavelength features. Nanotechnology, 2021, 32 (23), pp.235301. ⟨10.1088/1361-6528/abe3b6⟩. ⟨hal-03318890⟩
53 Consultations
239 Téléchargements

Altmetric

Partager

Gmail Mastodon Facebook X LinkedIn More