Communication Dans Un Congrès Année : 2025

Define a measurement standard to monitor local variabilities of immersion lithography baseline for photonic devices

Fichier non déposé

Dates et versions

hal-05454241 , version 1 (12-01-2026)

Identifiants

Citer

Rita Chidoub, Aurélie Le Pennec, Florent Dettoni, Ahmed Gharbi, Bertrand Le Gratiet, et al.. Define a measurement standard to monitor local variabilities of immersion lithography baseline for photonic devices. SPIE 2025 - Metrology, Inspection, and Process Control XXXIX, Feb 2025, San Jose, United States. pp.76, ⟨10.1117/12.3051034⟩. ⟨hal-05454241⟩
17 Consultations
0 Téléchargements

Altmetric

Partager

  • More