Cold plasma for Atomic Layer Processing: from ALD and ALE to Area Selective Deposition - Université Grenoble Alpes
Communication Dans Un Congrès Année : 2019

Cold plasma for Atomic Layer Processing: from ALD and ALE to Area Selective Deposition

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hal-02338883 , version 1 (30-10-2019)

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  • HAL Id : hal-02338883 , version 1

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Christophe Vallée. Cold plasma for Atomic Layer Processing: from ALD and ALE to Area Selective Deposition. International workshop on nanoparticles and nanostructures synthesized by plasmas for energy applications (XXXIV ICPIG) (ICRP-10), Jul 2019, Sapporo, Japan. ⟨hal-02338883⟩
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