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Communication Dans Un Congrès Année : 2019

Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl2/CH4 Plasma Chemistry

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hal-02324800 , version 1 (22-10-2019)

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  • HAL Id : hal-02324800 , version 1

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Jean-Pierre Landesman, Daniel T. Cassidy, Marc Fouchier, Erwine Pargon, Christophe Levallois, et al.. Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl2/CH4 Plasma Chemistry. 11th International Workshop on Plasma Etch and Strip in Microelectronics (PESM 2019), May 2019, Grenoble, France. ⟨hal-02324800⟩
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