CMOS platform for atomic-scale device fabrication

Tomáš Škereň; Nikola Pascher; Arnaud Garnier; Patrick Reynaud; Emmanuel Rolland; Aurélie Thuaire; Daniel Widmer; Xavier Jehl; Andreas Fuhrer

doi:10.1088/1361-6528/aad7ab

Journal Articles Nanotechnology Year : 2018

CMOS platform for atomic-scale device fabrication

, , (1) , (2) , , , , (3) ,

1
2
3

Tomáš Škereň

Function : Author

Nikola Pascher

Function : Author

Arnaud Garnier

Function : Author

Imperial College London

Patrick Reynaud

Function : Author

Commissariat à l'énergie atomique et aux énergies alternatives

Emmanuel Rolland

Function : Author

Aurélie Thuaire

Function : Author

Daniel Widmer

Function : Author

Xavier Jehl

Function : Author
PersonId : 172133
IdHAL : xavier-jehl
ORCID : 0000-0002-5342-9818
IdRef : 176333630

Laboratoire de Transport Electronique Quantique et Supraconductivité

Andreas Fuhrer

Function : Author

Domains

Physics [physics] Condensed Matter [cond-mat]

Xavier Jehl : Connect in order to contact the contributor

https://hal.univ-grenoble-alpes.fr/hal-02004029

Submitted on : Friday, February 1, 2019-3:04:49 PM

Last modification on : Monday, March 13, 2023-10:56:16 AM

Dates and versions

hal-02004029 , version 1 (01-02-2019)

Identifiers

HAL Id : hal-02004029 , version 1
DOI : 10.1088/1361-6528/aad7ab

Cite

Tomáš Škereň, Nikola Pascher, Arnaud Garnier, Patrick Reynaud, Emmanuel Rolland, et al.. CMOS platform for atomic-scale device fabrication. Nanotechnology, 2018, 29 (43), pp.435302. ⟨10.1088/1361-6528/aad7ab⟩. ⟨hal-02004029⟩

Export

BibTeX TEI Dublin Core DC Terms EndNote Datacite

Collections

CEA UGA INAC-SPSMS CEA-DRF IRIG CEA-GRE PHELIQS

129 View

0 Download

CMOS platform for atomic-scale device fabrication

Domains

Dates and versions

Identifiers

Cite

Export

Collections

Altmetric

Share