Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration - Université Grenoble Alpes
Article Dans Une Revue Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics Année : 2016
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hal-01882435 , version 1 (27-09-2018)

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Emmanuel Dupuy, Erwine Pargon, Marc Fouchier, H. Grampeix, J. Pradelles. Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics, 2016, 34 (5), ⟨10.1116/1.4962322⟩. ⟨hal-01882435⟩
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