Depth profiling analysis of HfON on SiON ultrathin films by parallel angle resolved x-ray photoelectron spectroscopy and medium energy ion scattering - Université Grenoble Alpes Accéder directement au contenu
Article Dans Une Revue Surface and Interface Analysis Année : 2016

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hal-01881936 , version 1 (26-09-2018)

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Laurent Fauquier, Bernard Pelissier, Denis Jalabert, Francois Pierre, Delphine Doloy, et al.. Depth profiling analysis of HfON on SiON ultrathin films by parallel angle resolved x-ray photoelectron spectroscopy and medium energy ion scattering. Surface and Interface Analysis, 2016, 48 (7), pp.436 - 439. ⟨10.1002/sia.5917⟩. ⟨hal-01881936⟩
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