Surface and plasma characterization of a self-limited two step etch process for SiN spacer etching applications. - Université Grenoble Alpes
Communication Dans Un Congrès Année : 2021
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hal-03448953 , version 1 (25-11-2021)

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  • HAL Id : hal-03448953 , version 1

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Nicolas Loubet, Camille Petit-Etienne, Cécile Jenny, Gilles Cunge, Erwine Pargon. Surface and plasma characterization of a self-limited two step etch process for SiN spacer etching applications.. Micro and Nano Engineering Conference, Sep 2021, turin, Italy. ⟨hal-03448953⟩
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