Nucleation of HfO2 on Si, SiO2 and TiN substrates in PE-ALD processes investigated by in situ ellipsometry and Optical Emission Specroscopy (OES) - Université Grenoble Alpes
Communication Dans Un Congrès Année : 2018
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hal-01959025 , version 1 (18-12-2018)

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  • HAL Id : hal-01959025 , version 1

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M. Bonvalot, S. Belahcen, V. Pesce, A. Chaker, P. Gonon, et al.. Nucleation of HfO2 on Si, SiO2 and TiN substrates in PE-ALD processes investigated by in situ ellipsometry and Optical Emission Specroscopy (OES). AVS 65th International Symposium 2018, Oct 2018, Long Beach, United States. ⟨hal-01959025⟩
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