Ultra-high selective etching in remote plasmas: application to smart etch processes - Université Grenoble Alpes
Communication Dans Un Congrès Année : 2017

Ultra-high selective etching in remote plasmas: application to smart etch processes

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hal-01891297 , version 1 (09-10-2018)

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  • HAL Id : hal-01891297 , version 1

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G. Cunge., C Petit−etienne., L Vallier., J Dubois., R Soriano., et al.. Ultra-high selective etching in remote plasmas: application to smart etch processes. PESM 2017 (Plasma Etch and Strip in Microtechnology), 2017, Louvain, Belgium. ⟨hal-01891297⟩
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