Impact of dielectrics thermodynamics properties on the diffusion of copper and oxygen in CuTe-based CBRAM devices. - Université Grenoble Alpes
Communication Dans Un Congrès Année : 2015

Impact of dielectrics thermodynamics properties on the diffusion of copper and oxygen in CuTe-based CBRAM devices.

Fichier non déposé

Dates et versions

hal-01877926 , version 1 (20-09-2018)

Identifiants

  • HAL Id : hal-01877926 , version 1

Citer

A. Marty, R. Gassilloud, E. Martinez, Corentin Vallée, M. Veillerot, et al.. Impact of dielectrics thermodynamics properties on the diffusion of copper and oxygen in CuTe-based CBRAM devices.. MRS, 2015, Boston, United States. ⟨hal-01877926⟩
61 Consultations
0 Téléchargements

Partager

More