Study of chemical elements diffusion before and after resistive switching in Ta2O5-based CBRAM. - Université Grenoble Alpes
Communication Dans Un Congrès Année : 2015

Study of chemical elements diffusion before and after resistive switching in Ta2O5-based CBRAM.

Fichier non déposé

Dates et versions

hal-01877907 , version 1 (20-09-2018)

Identifiants

  • HAL Id : hal-01877907 , version 1

Citer

A. Marty, R. Gassilloud, E. Martinez, Corentin Vallée, M. Veillerot, et al.. Study of chemical elements diffusion before and after resistive switching in Ta2O5-based CBRAM.. EMRS Spring, 2015., 2015, Lille, France. ⟨hal-01877907⟩
62 Consultations
0 Téléchargements

Partager

More