Area Selective Deposition: how plasma can favor the topographically selective deposition on 3D substrate

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http://hal.univ-grenoble-alpes.fr/hal-02338940
Contributor : Marielle Clot <>
Submitted on : Wednesday, October 30, 2019 - 11:02:21 AM
Last modification on : Friday, November 1, 2019 - 1:36:20 AM

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  • HAL Id : hal-02338940, version 1

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Citation

C. Vallee, M. Bonvalot, R. Gassilloud, V. Pesce, A. Chaker, et al.. Area Selective Deposition: how plasma can favor the topographically selective deposition on 3D substrate. ASD19 – 4th area selective deposition workshop – IMEC, Apr 2019, Leuven (Belgique), Belgium. ⟨hal-02338940⟩

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