TMD film growth studied by quasi-insitu XPS on a 300mm silicon wafer

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http://hal.univ-grenoble-alpes.fr/hal-02338914
Contributor : Marielle Clot <>
Submitted on : Wednesday, October 30, 2019 - 10:57:26 AM
Last modification on : Friday, November 1, 2019 - 1:36:20 AM

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  • HAL Id : hal-02338914, version 1

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Citation

M. Fraccaroli, R. Gassilloud, S. Cadot, B. Pellissier, Christophe Vallee, et al.. TMD film growth studied by quasi-insitu XPS on a 300mm silicon wafer. 18th European Conference on Applications of Surface and Interface Analyses (ECASIA), Sep 2019, Dresde, Germany. ⟨hal-02338914⟩

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