Cold plasma for Atomic Layer Processing: from ALD and ALE to Area Selective Deposition

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http://hal.univ-grenoble-alpes.fr/hal-02338883
Contributor : Marielle Clot <>
Submitted on : Wednesday, October 30, 2019 - 10:48:12 AM
Last modification on : Thursday, November 14, 2019 - 9:45:18 AM

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  • HAL Id : hal-02338883, version 1

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Vallée Christophe. Cold plasma for Atomic Layer Processing: from ALD and ALE to Area Selective Deposition. International workshop on nanoparticles and nanostructures synthesized by plasmas for energy applications (XXXIV ICPIG) (ICRP-10),, Jul 2019, Sapporo, Japan. ⟨hal-02338883⟩

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