Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl2/CH4 Plasma Chemistry

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http://hal.univ-grenoble-alpes.fr/hal-02324800
Contributor : Marielle Clot <>
Submitted on : Tuesday, October 22, 2019 - 9:41:13 AM
Last modification on : Monday, December 9, 2019 - 4:30:12 PM

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J.-P. Landesman, M. Fouchier, E. Pargon, N. Rochat, D.T. Cassidy, et al.. Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl2/CH4 Plasma Chemistry. Plasma Etch and Strip in Microelectronics (PESM), 11th International Workshop, May 2019, Grenoble, France. ⟨hal-02324800⟩

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