Tilted beam scanning electron microscopy, 3-D metrology for microelectronics industry

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http://hal.univ-grenoble-alpes.fr/hal-02324657
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Submitted on : Tuesday, October 22, 2019 - 8:45:32 AM
Last modification on : Thursday, October 24, 2019 - 1:38:00 AM

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Charles Valade, Jérôme Hazart, Sébastien Bérard-Bergery, Elodie Sungauer, Maxime Besacier, et al.. Tilted beam scanning electron microscopy, 3-D metrology for microelectronics industry. Journal of Micro/Nanolithography, MEMS, and MOEMS, Society of Photo-optical Instrumentation Engineers, 2019, 18 (03), pp.1. ⟨10.1117/1.JMM.18.3.034001⟩. ⟨hal-02324657⟩

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