Research Update: Atmospheric pressure spatial atomic layer deposition of ZnO thin films: Reactors, doping, and devices

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Submitted on : Sunday, March 24, 2019 - 10:11:46 AM
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Robert Hoye, David Muñoz-Rojas, Shelby Nelson, Andrea Illiberi, Paul Poodt, et al.. Research Update: Atmospheric pressure spatial atomic layer deposition of ZnO thin films: Reactors, doping, and devices. APL Materials, AIP Publishing 2015, 3 (4), pp.040701. ⟨10.1063/1.4916525⟩. ⟨hal-02077852⟩

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