Nano-lithography with high- block copolymers: interplay between self-organization and dewetting kinetics - Université Grenoble Alpes
Poster De Conférence Année : 2024

Nano-lithography with high- block copolymers: interplay between self-organization and dewetting kinetics

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hal-04765615 , version 1 (04-11-2024)

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  • HAL Id : hal-04765615 , version 1

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G. Forcina, M. Zelsmann, G. Fleury. Nano-lithography with high- block copolymers: interplay between self-organization and dewetting kinetics. Journées Surfaces et Interfaces – JSI 2024, Jan 2024, Grenoble, France. ⟨hal-04765615⟩
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