Communication Dans Un Congrès Année : 2024

Nano-lithography with high- block copolymers: interplay between self-organization and dewetting kinetics

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hal-04765436 , version 1 (04-11-2024)

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  • HAL Id : hal-04765436 , version 1

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G. Forcina, C. Petit-Etienne, S. Cavalaglio, B. Cabannes-Boué, M. Panabiere, et al.. Nano-lithography with high- block copolymers: interplay between self-organization and dewetting kinetics. IUPAC Macro 2024, Jul 2024, Warwick, United Kingdom. ⟨hal-04765436⟩
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