Self-assembly and dry etching of high- block copolymers in a microelectronics context - Université Grenoble Alpes
Communication Dans Un Congrès Année : 2024

Self-assembly and dry etching of high- block copolymers in a microelectronics context

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hal-04765390 , version 1 (04-11-2024)

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  • HAL Id : hal-04765390 , version 1

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M. Zelsmann. Self-assembly and dry etching of high- block copolymers in a microelectronics context. International Conference on Directed Self‐Assembly and Nanostructured Materials – DSA 2024, Oct 2024, Grenoble, France. ⟨hal-04765390⟩
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