Plasma etching processes of a sub-10 nm resolution high-χ block copolymer self-assembled into spin-on-carbon trenches - Université Grenoble Alpes
Communication Dans Un Congrès Année : 2023

Plasma etching processes of a sub-10 nm resolution high-χ block copolymer self-assembled into spin-on-carbon trenches

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hal-04594538 , version 1 (30-05-2024)

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  • HAL Id : hal-04594538 , version 1

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A. F. Putranto, C. Petit-Etienne, B. Cabannes-Boué, G. Fleury, G. Cunge, et al.. Plasma etching processes of a sub-10 nm resolution high-χ block copolymer self-assembled into spin-on-carbon trenches. Plasma Etch and Strip for Microtechnology workshop – PESM 2023, Jun 2023, Grenoble, France. ⟨hal-04594538⟩
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