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Article Dans Une Revue Dalton Transactions Année : 2021

Atomic and Molecular Layer Deposition Area Selective Deposition using alternate deposition and etch super-cycle strategies.

Résumé

Area Selective Deposition (ASD) is a bottom-up process leading to a uniform deposit in only desired areas of a patterned substrate, avoiding the use of photolithography for patterning. However, whatever...
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Dates et versions

hal-03449134 , version 1 (25-11-2021)

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Marceline Bonvalot, Christophe Vallee, Cedric Mannequin, Moustapha Jaffal, Remy Gassilloud, et al.. Atomic and Molecular Layer Deposition Area Selective Deposition using alternate deposition and etch super-cycle strategies.. Dalton Transactions, 2021, ⟨10.1039/D1DT03456A⟩. ⟨hal-03449134⟩
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