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Communication Dans Un Congrès Année : 2021

III-V/Ge Heterostructure Plasma Etching and Passivation With a Single Plasma Process for Low-Damage Multijunction Solar Cell Fabrication,

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hal-03448973 , version 1 (25-11-2021)

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  • HAL Id : hal-03448973 , version 1

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Mathieu De Lafontaine, E. Pargon, G. Gay, C. Petit-Etienne, J. Barnes, et al.. III-V/Ge Heterostructure Plasma Etching and Passivation With a Single Plasma Process for Low-Damage Multijunction Solar Cell Fabrication,. AVS 67 Virtual Symposium, Oct 2021, Virtual Symposium, United States. ⟨hal-03448973⟩
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