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A first outlook of sputtered FeWO4 thin films for micro-supercapacitor electrodes

Abstract : The next generation of Internet of Things devices requires micro-supercapacitors operating at high voltage which is difficult to achieve using symmetrical design. Thus, their fabrication in an asymmetric configuration is mandatory. While MnO2 is well-established as positive electrode, the scarcity of existing efficient materials able to be used at the negative side drives the research towards new promising materials. Since few years, a new class of oxide materials, named multicationic oxides, were demonstrated to be attractive solutions as bulk electrodes for electrochemical capacitor. Among them, the wolframite-type FeWO4 oxide was proposed as an interesting negative electrode material for asymmetric FeWO4/MnO2 electrochemical capacitors. The present paper reports for the first time on the successful thin film synthesis of such iron-tungstate oxide films by reactive DC magnetron sputtering, a deposition method widely used in the semiconductor industry to manufacture micro-devices. The pseudocapacitive behaviour documented at the bulk scale is preserved at the thin film level as well, and opens-up the possibility to use FeWO4 in the next generations of micro-supercapacitors.
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https://hal.archives-ouvertes.fr/hal-03194252
Contributeur : Richard Baschera <>
Soumis le : lundi 12 avril 2021 - 09:35:19
Dernière modification le : lundi 10 mai 2021 - 15:36:03

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Gaëtan Buvat, Antonella Iadecola, Florent Blanchard, Thierry Brousse, Pascal Roussel, et al.. A first outlook of sputtered FeWO4 thin films for micro-supercapacitor electrodes. Journal of The Electrochemical Society, Electrochemical Society, 2021, 168 (3), pp.030524. ⟨10.1149/1945-7111/abec57⟩. ⟨hal-03194252⟩

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