Development of a robust fabrication process for single silicon nanowire-based omega gate transistors on polyamide substrate - Université Grenoble Alpes
Article Dans Une Revue Semiconductor Science and Technology Année : 2020
Fichier non déposé

Dates et versions

hal-03118921 , version 1 (22-01-2021)

Identifiants

Citer

T Arjmand, M Legallais, T Haffner, M Bawedin, C Ternon, et al.. Development of a robust fabrication process for single silicon nanowire-based omega gate transistors on polyamide substrate. Semiconductor Science and Technology, 2020, 36 (2), pp.025003. ⟨10.1088/1361-6641/abcade⟩. ⟨hal-03118921⟩
31 Consultations
0 Téléchargements

Altmetric

Partager

More