Plasma Enhanced CVD processes: Dual Frequency with pulsing of liquid precursors and PEALD for Selective Deposition
Corentin Vallée
(1)
,
R. Gassilloud
(2)
,
R. Vallat
(1)
,
F. Piallat
(1)
,
A. Aoukar
(1)
,
P. Kowalczyk
(1)
,
P.D. Szkutnik
(1)
,
P. Noe
,
T. Wakrim
(1)
,
P. Gonon
(1)