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Communication Dans Un Congrès Année : 2015

Plasma etching optimization and alignment control of directed self-assembled high-Χ cylindrical PS-PDMS

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hal-01877841 , version 1 (20-09-2018)

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  • HAL Id : hal-01877841 , version 1

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S. Böhme, J. Garnier, C. Girardot, J. Arias-Zapata, S. Arnaud, et al.. Plasma etching optimization and alignment control of directed self-assembled high-Χ cylindrical PS-PDMS. European Materials Research Society conference- E-MRS 2015, Spring Meeting, May 2015, Lille, France. ⟨hal-01877841⟩
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