Loading...
Derniers dépôts
-
Simon Chouteau, L. Stafford, Agnès Granier, Antoine Goullet, Mireille Richard-Plouet. Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled Flash Boiling Atomization. Langmuir, 2024, 40 (6), pp.3015-3023. ⟨10.1021/acs.langmuir.3c03176⟩. ⟨hal-04549282⟩
-
Issraa Shahine, Quentin Hatte, Maxime Harnois, Pierre-Yves Tessier. Large Area Freestanding Au Nanoporous Ultrathin Films Transfer Printed on Bendable Substrates and 3D Surfaces for Flexible Electronics. ACS Applied Electronic Materials, 2024, 6 (4), pp.2281-2288. ⟨10.1021/acsaelm.3c01771⟩. ⟨hal-04552765⟩
-
Pascal Bargiela, Vincent Fernandez, Christophe Cardinaud, John Walton, Mark Greiner, et al.. Towards a reliable assessment of charging effects during surface analysis: Accurate spectral shapes of ZrO2 and Pd/ZrO2 via X-ray Photoelectron Spectroscopy. Applied Surface Science, 2021, 566, pp.150728. ⟨10.1016/j.apsusc.2021.150728⟩. ⟨hal-03355769⟩
-
Allan Lebreton, Marie-Paule Besland, Pierre-Yves Jouan, Tatiana Signe, Cédric Mannequin, et al.. Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors. Journal of Vacuum Science & Technology A, 2024, 42 (2), pp.023405. ⟨10.1116/5.0177028⟩. ⟨hal-04423908⟩
-
Michael Rodriguez-Fano, Mohamad Haydoura, Julien Tranchant, Etienne Janod, Benoît Corraze, et al.. Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr1–xVx)2O3. ACS Applied Materials & Interfaces, 2023, 15 (47), pp.54611-54621. ⟨10.1021/acsami.3c09387⟩. ⟨hal-04361024⟩
-
J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, et al.. Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge. Journal of Vacuum Science & Technology A, 2023, 41 (6), pp.063003. ⟨10.1116/6.0002857⟩. ⟨hal-04299303⟩
-
T Meyer, A Girard, M Bouška, E Baudet, M Baillieul, et al.. Mass spectrometry and in situ x-ray photoelectron spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-based plasma. Plasma Sources Science and Technology, 2023, 32 (8), pp.085003. ⟨10.1088/1361-6595/aceaa5⟩. ⟨hal-04186877⟩
-
Anthony Valero, Adrien Mery, Dorian Gaboriau, Marc Dietrich, Maggie Fox, et al.. Redefining high-k dielectric materials vision at nanoscale for energy storage: A new electrochemically active protection barrier. Electrochimica Acta, 2021, 389, pp.138727. ⟨10.1016/j.electacta.2021.138727⟩. ⟨hal-03355843⟩
-
Rémi Dussart, Thomas Tillocher, Gaelle Antoun, Jack Nos, Philippe Lefaucheux, et al.. Plasma cryogenic etching processes: what are the mechanisms involved at very low temperature ?. 14th EU-Japan Joint Symposium on Plasma Processing (JSPP) 2023, Satoshi Hamaguchi, Apr 2023, Okinawa, Japan, Japan. ⟨hal-04072312⟩
Rechercher
Nombre de documents
77
Nombre de notices
277
Mots-clés
Capacitance
Chalcogenide
Sputtering
Oxides
CaTiO3Pr^3^+
A3 Physical vapor deposition processes
Chemical and biological sensors
Colloidal solution
Chalcogenide glass
AZO thin films
TEM
Optical properties
Applications industrielles
Non-volatile memory
A1 Characterization
Amyloid precursor
Carbon nitride
Resistive switching
Thin film
Amorphous
Mott insulator
AuCu alloy
B Chemical synthesis
CNTs’ collapse
Low-pressure plasma processing
Bipolar resistive switching BRS
Titanium dioxide
Sol-gel
Biomasse
Spectroscopic ellipsometry
CH4
CHLORINE PLASMAS
Avalanche breakdown
Cathepsin
Copper
TiO2
Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation
CIGSe
XPS
Transfert d'énergie
C Photoelectron spectroscopy
Nanotubes
Structure
Kirkendall effect
Functionalization
Thin films
Bixbyite
Nanocomposite
AlN
Etching
SF 6
Vanadium Sesquioxide
Buffer Couple
A Multilayers
B1 Inorganic compounds
X-ray photoelectron spectroscopy
Carbon nanotubes
Calcined clay
Atomic force microscopy
A Thin films
Biofilms microbiens
B2 Quaternary
Physical vapor deposition
V2O3
Aryl-diazonium salts
Magnetron sputtering
BOMBARDMENT
Alzheimer's disease
Band gap
Scanning electron microscopy
B3 Solar cells
Films
Atomic layer etching
Residual stress
Carbon
Anatase
Plasmas froids
Mott insulators
Semiconductors
B2 Semiconducting alloys
Chalcogenides
Chemical detection
Transmission electron microscopy
Biocapteurs
Adsorption
Plasma etching
Carbon Nanotube
A Chalcogenides
Aluminium nitride
Selenization
NEXAFS
Ablation laser
X-ray diffraction
Band alignment
B2 Semiconducting indium compounds
Alloying
Ambipolar material
3 nm in size
PECVD
A-CNx