Plasma-induced damage during III-V semiconductor patterning for photonic and photovoltaic applications: from characterization to minimization

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http://hal.univ-grenoble-alpes.fr/hal-02362107
Contributor : Marielle Clot <>
Submitted on : Wednesday, November 13, 2019 - 5:12:52 PM
Last modification on : Tuesday, November 19, 2019 - 2:07:29 AM

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E. Pargon, M.De Lafontaine, M. Fouchier, C. Petit-Etienne, G. Gay, et al.. Plasma-induced damage during III-V semiconductor patterning for photonic and photovoltaic applications: from characterization to minimization. 18th conference on defects recognition, imaging and physics in semiconductors (DRIP XVIII), Sep 2019, Berlin, Germany. ⟨hal-02362107⟩

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