Single batch strategies for the development of an Area Selective Deposition process with the deposition/etch approach

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http://hal.univ-grenoble-alpes.fr/hal-02338983
Contributor : Marielle Clot <>
Submitted on : Wednesday, October 30, 2019 - 11:09:56 AM
Last modification on : Friday, November 1, 2019 - 1:36:20 AM

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  • HAL Id : hal-02338983, version 1

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C. Vallee, M. Bonvalot, R. Gassilloud, V. Pesce, A. Chaker, et al.. Single batch strategies for the development of an Area Selective Deposition process with the deposition/etch approach. 19th International Conference on Atomic layer Deposition (ALD2019), Jul 2019, Bellevue (USA), United States. ⟨hal-02338983⟩

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