Characterizing Ultra-thin Layer Growth and Area Selective Deposition using High Resolution Low Energy Ion Scattering (LEIS)

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http://hal.univ-grenoble-alpes.fr/hal-02338900
Contributor : Marielle Clot <>
Submitted on : Wednesday, October 30, 2019 - 10:53:12 AM
Last modification on : Friday, November 1, 2019 - 1:36:20 AM

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  • HAL Id : hal-02338900, version 1

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T. Grehl, P. Brüner, V. Pesce, B. Pelissier, R. Gassilloud, et al.. Characterizing Ultra-thin Layer Growth and Area Selective Deposition using High Resolution Low Energy Ion Scattering (LEIS). AVS 66th International Symposium 2019, Oct 2019, Colombus, United States. ⟨hal-02338900⟩

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