In line and ex situ metrology and characterization to enable Area Selective Deposition

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http://hal.univ-grenoble-alpes.fr/hal-02338893
Contributor : Marielle Clot <>
Submitted on : Wednesday, October 30, 2019 - 10:51:18 AM
Last modification on : Friday, November 1, 2019 - 1:36:20 AM

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  • HAL Id : hal-02338893, version 1

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Citation

C. Vallee, M. Bonvalot, B. Pelissier, J.H. Tortai, S. David, et al.. In line and ex situ metrology and characterization to enable Area Selective Deposition. AVS 66th International Symposium 2019, Oct 2019, Colombus (USA), United States. ⟨hal-02338893⟩

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