Controlling the Current Conduction Asymmetry of HfO 2 Metal–Insulator–Metal Diodes by Interposing Al 2 O 3 Layer

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Submitted on : Tuesday, October 22, 2019 - 11:35:37 AM
Last modification on : Wednesday, October 23, 2019 - 9:09:22 AM

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Woojin Jeon, Olivier Salicio, Ahmad Chaker, Patrice Gonon, Christophe Vallée. Controlling the Current Conduction Asymmetry of HfO 2 Metal–Insulator–Metal Diodes by Interposing Al 2 O 3 Layer. IEEE Transactions on Electron Devices, Institute of Electrical and Electronics Engineers, 2019, 66 (1), pp.402-406. ⟨10.1109/TED.2018.2881220⟩. ⟨hal-02325464⟩

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