Plasma etching processes for the fabrication of a low-loss SiN micro-resonator and low power threshold of parametric oscillations

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http://hal.univ-grenoble-alpes.fr/hal-02324790
Contributor : Marielle Clot <>
Submitted on : Tuesday, October 22, 2019 - 9:38:41 AM
Last modification on : Monday, December 9, 2019 - 4:30:12 PM

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L. Youssef, E. Pargon, C. Petit-Etienne, H. El Dirani, C. Sciancalepore. Plasma etching processes for the fabrication of a low-loss SiN micro-resonator and low power threshold of parametric oscillations. Plasma Etch and Strip in Microelectronics (PESM), 11th International Workshop, May 2019, Grenoble, France. ⟨hal-02324790⟩

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