Graphoepitaxy integration and pattern transfer of lamellar silicon-containing high-chi block copolymers

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Conference papers
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http://hal.univ-grenoble-alpes.fr/hal-01954390
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Submitted on : Thursday, December 13, 2018 - 4:00:56 PM
Last modification on : Wednesday, April 3, 2019 - 2:08:45 AM

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Marc Zelsmann, Philippe Bézard, Xavier Chevalier, Antoine Legrain, Christophe Navarro, et al.. Graphoepitaxy integration and pattern transfer of lamellar silicon-containing high-chi block copolymers. SPIE Advanced Lithography, 2018, San José, United States. ⟨10.1117/12.2299337⟩. ⟨hal-01954390⟩

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